Invention Grant
- Patent Title: Measurement of properties of patterned photoresist
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Application No.: US17160547Application Date: 2021-01-28
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Publication No.: US11644419B2Publication Date: 2023-05-09
- Inventor: Roie Volkovich , Liran Yerushalmi , Amnon Manassen , Yoram Uziel
- Applicant: KLA Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA Corporation
- Current Assignee: KLA Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Hodgson Russ LLP
- Main IPC: G01N21/41
- IPC: G01N21/41 ; G01N21/3563 ; G01N21/956 ; G01B9/02 ; G01N21/45 ; G01N21/25

Abstract:
A method for optical inspection includes illuminating a patterned polymer layer on a semiconductor wafer with optical radiation over a range of infrared wavelengths, measuring spectral properties of the optical radiation reflected from multiple points on the patterned polymer layer over the range of infrared wavelengths, and based on the measured spectral properties, computing a complex refractive index of the patterned polymer layer.
Public/Granted literature
- US20220236181A1 MEASUREMENT OF PROPERTIES OF PATTERNED PHOTORESIST Public/Granted day:2022-07-28
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