Invention Grant
- Patent Title: Method of manufacturing multilayer chip component
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Application No.: US17166052Application Date: 2021-02-03
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Publication No.: US11645480B2Publication Date: 2023-05-09
- Inventor: Gaku Echigoya , Hiroshi Satou , Keijiro Ishida , Hajime Kudo
- Applicant: TDK CORPORATION
- Applicant Address: JP Tokyo
- Assignee: TDK CORPORATION
- Current Assignee: TDK CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP 2020018693 2020.02.06
- Main IPC: G06K1/12
- IPC: G06K1/12 ; H01G4/002 ; G06K19/06

Abstract:
In a method of manufacturing a multilayer chip component according to an aspect of the present disclosure, laser processing is used for forming dots of a two-dimensional code. This laser processing is laser processing with respect to a laminate substrate in a state before baking is performed, and an impact at the time of processing is absorbed to a certain degree due to elastic deformation of the laminate substrate. For this reason, according to the manufacturing method, occurrence of cracking can be curbed compared to laser processing with respect to an element body in a state after baking is performed.
Public/Granted literature
- US20210248327A1 METHOD OF MANUFACTURING MULTILAYER CHIP COMPONENT Public/Granted day:2021-08-12
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