Invention Grant
- Patent Title: Low dark count rate semiconductor structures
-
Application No.: US17523444Application Date: 2021-11-10
-
Publication No.: US11646389B2Publication Date: 2023-05-09
- Inventor: Daniel Gäbler
- Applicant: Daniel Gäbler
- Applicant Address: DE Apolda
- Assignee: X-FAB Global Services GmbH
- Current Assignee: X-FAB Global Services GmbH
- Current Assignee Address: DE Erfurt
- Agency: Thompson Hine LLP
- Priority: GB 17847 2020.11.12
- Main IPC: H01L31/103
- IPC: H01L31/103 ; H01L31/107 ; H01L29/06 ; H01L31/18 ; H01L31/109

Abstract:
A light sensitive semiconductor structure including a pn-junction in a silicon substrate. The pn-junction includes a central part and an edge part around surrounding the central part, the edge part being in contact with a surface of the silicon substrate. The structure further includes a plasma shielding structure covering at least a depletion width of the pn-junction over at least a part of the edge part where the edge part contacts the surface of the silicon substrate.
Public/Granted literature
- US20220149222A1 LOW DARK COUNT RATE SEMICONDUCTOR STRUCTURES Public/Granted day:2022-05-12
Information query
IPC分类: