Invention Grant
- Patent Title: Method of manufacturing light-emitting device
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Application No.: US17342233Application Date: 2021-06-08
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Publication No.: US11646392B2Publication Date: 2023-05-09
- Inventor: Keiji Sakamoto , Takashi Abe , Hitoshi Minakuchi , Tsuyoshi Ito , Katsuyuki Kawabata , Kenji Hashizume
- Applicant: NICHIA CORPORATION
- Applicant Address: JP Anan
- Assignee: NICHIA CORPORATION
- Current Assignee: NICHIA CORPORATION
- Current Assignee Address: JP Anan
- Agency: Foley & Lardner LLP
- Priority: JP 2020100295 2020.06.09 JP 2021005983 2021.01.18
- Main IPC: H01L33/00
- IPC: H01L33/00 ; H01L33/50

Abstract:
A method of manufacturing a light-emitting device includes: providing a substrate having a first surface and a second surface opposite to the first surface; forming, on or above the first surface of the substrate, a semiconductor structure comprising a light-emitting layer; forming a crack inside the substrate, the crack reaching the first surface of the substrate; disposing a wavelength conversion layer on the second surface of the substrate; forming a first recess in the wavelength conversion layer by removing a first portion of the wavelength conversion layer, the first portion overlapping with the crack when viewed in a direction from the wavelength conversion layer toward the semiconductor structure, and leaving a second portion of the wavelength conversion layer between the first recess and the semiconductor structure; and cleaving the second portion along the crack.
Public/Granted literature
- US20210384375A1 METHOD OF MANUFACTURING LIGHT-EMITTING DEVICE Public/Granted day:2021-12-09
Information query
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