Invention Grant
- Patent Title: Element and method for manufacturing element
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Application No.: US17060346Application Date: 2020-10-01
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Publication No.: US11646677B2Publication Date: 2023-05-09
- Inventor: Tomoaki Sugawara , Junichiro Natori , Tsuneaki Kondoh , Yuko Arizumi
- Applicant: Ricoh Company, Ltd.
- Applicant Address: JP Tokyo
- Assignee: RICOH COMPANY, LTD.
- Current Assignee: RICOH COMPANY, LTD.
- Current Assignee Address: JP Tokyo
- Agency: Xsensus LLP
- Priority: JP 2019188072 2019.10.11
- Main IPC: H02N1/04
- IPC: H02N1/04 ; H01G7/02

Abstract:
An element includes a pair of electrodes, an intermediate layer between the pair of electrodes, and at least one insulator layer between the pair of electrodes. The intermediate layer contains a silicon compound including unpaired electrons as a material. The intermediate layer is deformable.
Public/Granted literature
- US20210111644A1 ELEMENT AND METHOD FOR MANUFACTURING ELEMENT Public/Granted day:2021-04-15
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