Invention Grant
- Patent Title: Gas solution manufacturing device
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Application No.: US17164026Application Date: 2021-02-01
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Publication No.: US11648515B2Publication Date: 2023-05-16
- Inventor: Suguru Ozawa , Yuji Araki , Yoichi Nakagawa , Toshifumi Watanabe
- Applicant: EBARA CORPORATION
- Applicant Address: JP Tokyo
- Assignee: EBARA CORPORATION
- Current Assignee: EBARA CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Pearne & Gordon LLP
- Priority: JP 2020019162 2020.02.06
- Main IPC: B01F3/04
- IPC: B01F3/04 ; B01F23/231 ; B01F23/40 ; B01F23/80 ; B01F25/31 ; B01F35/60 ; B01F35/21 ; B01F35/221 ; B01F35/71 ; B01F23/237 ; B01F101/48

Abstract:
A gas solution manufacturing device 1 includes a gas supply line 2 configured to supply a gas as a raw material of a gas solution, a liquid supply line 3 configured to supply a liquid as a raw material of the gas solution, a gas solution production unit 4 configured to mix the gas and the liquid together to produce the gas solution, a gas-liquid separation unit 5 configured to perform gas-liquid separation of the produced gas solution into a supplied liquid to be supplied to a use point and a discharged gas to be discharged through an exhaust port, and a gas dissolving unit 6 provided in the liquid supply line 4 and configured to dissolve the discharged gas resulting from the gas-liquid separation in the liquid. The gas dissolving unit 6 is configured with a hollow fiber membrane configured with a gas permeable membrane.
Public/Granted literature
- US20210245115A1 GAS SOLUTION MANUFACTURING DEVICE Public/Granted day:2021-08-12
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