Invention Grant
- Patent Title: Particle filter for MEMS device
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Application No.: US17192989Application Date: 2021-03-05
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Publication No.: US11649162B2Publication Date: 2023-05-16
- Inventor: Chia-Hua Chu , Chun-Wen Cheng , Wen Cheng Kuo
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Eschweiler & Potashnik, LLC
- Main IPC: B81C1/00
- IPC: B81C1/00 ; B81B7/00 ; B81B7/02

Abstract:
Various embodiments of the present disclosure are directed towards a method for manufacturing a microelectromechanical systems (MEMS) device. The method includes forming a particle filter layer over a carrier substrate. The particle filter layer is patterned while the particle filter layer is disposed on the carrier substrate to define a particle filter in the particle filter layer. A MEMS substrate is bonded to the carrier substrate. A MEMS structure is formed over the MEMS substrate.
Public/Granted literature
- US20210188627A1 PARTICLE FILTER FOR MEMS DEVICE Public/Granted day:2021-06-24
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