- Patent Title: Electroplating apparatus and electroplating method using the same
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Application No.: US16573905Application Date: 2019-09-17
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Publication No.: US11649555B2Publication Date: 2023-05-16
- Inventor: Gotae Kim , WooChan Kim , Changjun Choi , SangCheol Moon , Wook Kim
- Applicant: LG Display Co., Ltd.
- Applicant Address: KR Seoul
- Assignee: LG Display Co., Ltd.
- Current Assignee: LG Display Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Seed IP Law Group LLP
- Priority: KR 20180173557 2018.12.31
- Main IPC: C25D5/04
- IPC: C25D5/04 ; C25D17/02
Abstract:
An electroplating apparatus includes a plating bath and a substrate in a horizontal direction. The electroplating apparatus further includes a plurality of cathodes on first and second sides of the substrate in a first direction on one surface of the substrate, and an anode above the substrate, the anode being spaced apart from the substrate and configured to be movable in the first direction.
Public/Granted literature
- US20200208290A1 ELECTROPLATING APPARATUS AND ELECTROPLATING METHOD USING THE SAME Public/Granted day:2020-07-02
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