Invention Grant
- Patent Title: Metrology apparatus and method for determining a characteristic of one or more structures on a substrate
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Application No.: US17314469Application Date: 2021-05-07
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Publication No.: US11650047B2Publication Date: 2023-05-16
- Inventor: Patricius Aloysius Jacobus Tinnemans , Vasco Tomas Tenner , Arie Jeffrey Den Boef , Hugo Augustinus Joseph Cramer , Patrick Warnaar , Grzegorz Grzela , Martin Jacobus Johan Jak
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP 158745 2018.02.27 EP 202289 2018.10.24
- Main IPC: G01B11/25
- IPC: G01B11/25 ; G03F7/20 ; G02B27/42 ; G03H1/00 ; G03H1/04
Abstract:
Disclosed is a method and associated apparatus for measuring a characteristic of interest relating to a structure on a substrate. The method comprises calculating a value for the characteristic of interest directly from the effect of the characteristic of interest on at least the phase of illuminating radiation when scattered by the structure, subsequent to illuminating said structure with said illuminating radiation.
Public/Granted literature
- US20210325174A1 METROLOGY APPARATUS AND METHOD FOR DETERMINING A CHARACTERISTIC OF ONE OR MORE STRUCTURES ON A SUBSTRATE Public/Granted day:2021-10-21
Information query
