Invention Grant
- Patent Title: Method of low-temperature plasma generation, method of an electrically conductive or ferromagnetic tube coating using pulsed plasma and corresponding devices
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Application No.: US17086414Application Date: 2020-11-01
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Publication No.: US11651937B2Publication Date: 2023-05-16
- Inventor: Zden{hacek over (e)}k Hubi{hacek over (c)}ka , Martin {hacek over (C)}ada , Petra K{hacek over (s)}írová , Miloslav Klinger
- Applicant: FYZIKALNI USTAV AV CR, V.V.I
- Applicant Address: CZ Prague
- Assignee: FYZIKALINI USTAV AV CR, V.V.I.
- Current Assignee: FYZIKALINI USTAV AV CR, V.V.I.
- Current Assignee Address: CZ Prague
- Agent Michael D. Eisenberg
- Priority: CZ 2018206 2018.05.02 LU 0893 2018.08.08
- Main IPC: H01J37/32
- IPC: H01J37/32 ; C23C14/04 ; C23C14/34
Abstract:
The present invention resides in the unifying idea of synchronizing a positive voltage pulse supplied to an electrically conductive or ferromagnetic tube and a exciting negative voltage pulse on a hollow cathode induced on the background of a high-frequency capacitive discharge.
In one embodiment, the invention relates to a method of generating low-temperature plasma in a vacuum chamber comprising a hollow cathode and an electrode, the method comprising the step of igniting the pulsed DC discharge in the hollow cathode wherein the positive voltage pulse at least partially overlaps with the negative voltage pulse, and the positive voltage pulse at least partially overlaps with the negative voltage pulse on the hollow cathode.
In another embodiment, the present invention relates to a method of coating the inner walls of hollow tubes which utilizes the above-mentioned low-temperature plasma generation process.
In another embodiment, the invention relates to a low-temperature plasma generating device comprising a hollow cathode located in the vacuum chamber, a RF plasma source, a pulse DC burst source, and a bipolar pulse source.
In another embodiment, an object of the invention is an apparatus adapted to coat the inner sides of hollow tubes comprising a low-temperature plasma generating device.
In one embodiment, the invention relates to a method of generating low-temperature plasma in a vacuum chamber comprising a hollow cathode and an electrode, the method comprising the step of igniting the pulsed DC discharge in the hollow cathode wherein the positive voltage pulse at least partially overlaps with the negative voltage pulse, and the positive voltage pulse at least partially overlaps with the negative voltage pulse on the hollow cathode.
In another embodiment, the present invention relates to a method of coating the inner walls of hollow tubes which utilizes the above-mentioned low-temperature plasma generation process.
In another embodiment, the invention relates to a low-temperature plasma generating device comprising a hollow cathode located in the vacuum chamber, a RF plasma source, a pulse DC burst source, and a bipolar pulse source.
In another embodiment, an object of the invention is an apparatus adapted to coat the inner sides of hollow tubes comprising a low-temperature plasma generating device.
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