Invention Grant
- Patent Title: Semiconductor device and method for making the same
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Application No.: US17313451Application Date: 2021-05-06
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Publication No.: US11652106B2Publication Date: 2023-05-16
- Inventor: Pei-Yu Chou , Yi-Ting Fu , Ting-Gang Chen , Tze-Liang Lee
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Main IPC: H01L29/76
- IPC: H01L29/76 ; H01L29/94 ; H01L27/092 ; H01L29/78 ; H01L29/66 ; H01L29/06

Abstract:
A semiconductor device includes a plurality of semiconductor fins, at least one gate stack, a refill isolation, and an air gap. Each of the semiconductor fins extends in an X direction. Two adjacent ones of the semiconductor fins are spaced apart from each other in a Y direction transverse to the X direction. The at least one gate stack has two stack sections spaced apart from each other in the Y direction. The stack sections are disposed over two adjacent ones of the semiconductor fins, respectively. The refill isolation and the air gap are disposed between the stack sections.
Public/Granted literature
- US20220359515A1 SEMICONDUCTOR DEVICE AND METHOD FOR MAKING THE SAME Public/Granted day:2022-11-10
Information query
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