Invention Grant
- Patent Title: Surface-emitting semiconductor laser
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Application No.: US16766285Application Date: 2018-11-22
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Publication No.: US11652333B2Publication Date: 2023-05-16
- Inventor: Yoshiaki Watanabe , Takayuki Kawasumi
- Applicant: SONY SEMICONDUCTOR SOLUTIONS CORPORATION
- Applicant Address: JP Kanagawa
- Assignee: SONY SEMICONDUCTOR SOLUTIONS CORPORATION
- Current Assignee: SONY SEMICONDUCTOR SOLUTIONS CORPORATION
- Current Assignee Address: JP Kanagawa
- Agency: Chip Law Group
- Priority: JP 2017230071 2017.11.30
- International Application: PCT/JP2018/043192 2018.11.22
- International Announcement: WO2019/107273A 2019.06.06
- Date entered country: 2020-05-21
- Main IPC: H01S5/183
- IPC: H01S5/183 ; H01S5/042 ; H01S5/02

Abstract:
A surface-emitting semiconductor laser includes a substrate, a first electrode provided in contact with the substrate, a first light reflection layer provided over the substrate, a second light reflection layer provided over the substrate, an active layer provided between the second light reflection layer and the first light reflection layer, a current confining layer that is provided between the active layer and the second light reflection layer and includes a current injection region, a second electrode provided over the substrate, with the second light reflection layer being interposed between the second electrode and the substrate, and a contact layer that is provided between the second electrode and the second light reflection layer and includes a contact region that is in contact with the second electrode, in which the contact region has a smaller area than an area of the current injection region.
Public/Granted literature
- US20210265819A1 SURFACE-EMITTING SEMICONDUCTOR LASER Public/Granted day:2021-08-26
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