Invention Grant
- Patent Title: Manufacturing techniques and corresponding devices for magnetic tunnel junction devices
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Application No.: US17184997Application Date: 2021-02-25
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Publication No.: US11653572B2Publication Date: 2023-05-16
- Inventor: Harry-Hak-Lay Chuang , Hung Cho Wang , Tien-Wei Chiang , Wen-Chun You
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Eschweiler & Potashnik, LLC
- The original application number of the division: US14801988 2015.07.17
- Main IPC: H01L29/82
- IPC: H01L29/82 ; H01L43/12 ; H01L27/22 ; H01L43/08

Abstract:
Some embodiments relate to a magnetoresistive random-access memory (MRAM) cell. The cell includes a bottom electrode having a central bottom electrode portion surrounded by a peripheral bottom electrode portion. Step regions of the conductive bottom electrode couple the central and peripheral bottom electrode portions to one another such that an upper surface of the central portion is recessed relative to an upper surface of the peripheral portion. A magnetic tunneling junction (MTJ) has MTJ outer sidewalls which are disposed over the bottom central electrode portion and which are arranged between the step regions. A top electrode is disposed over an upper surface of the MTJ. Other devices and methods are also disclosed.
Public/Granted literature
- US20210184110A1 MANUFACTURING TECHNIQUES AND CORRESPONDING DEVICES FOR MAGNETIC TUNNEL JUNCTION DEVICES Public/Granted day:2021-06-17
Information query
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