Invention Grant
- Patent Title: Temperature control device for chemical liquid used in semiconductor manufacturing process
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Application No.: US17145379Application Date: 2021-01-10
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Publication No.: US11654451B2Publication Date: 2023-05-23
- Inventor: Min Cheol Bang
- Applicant: Min Cheol Bang
- Applicant Address: KR Hwaseong-si
- Assignee: Min Cheol Bang
- Current Assignee: Min Cheol Bang
- Current Assignee Address: KR Hwaseong-si
- Agency: Lex IP Meister, PLLC
- Priority: KR 20200004302 2020.01.13
- Main IPC: B05C11/10
- IPC: B05C11/10

Abstract:
A temperature control device for a chemical liquid used in a semiconductor manufacturing process. The device includes: a first heat sink having a cooling water flow path formed therein; a plurality of thermoelectric modules coming into contact with both side surfaces of the first heat sink, respectively; and a second heat sink coming into contact with the thermoelectric modules. The second heat sink includes first and second heat sink blocks, a chemical liquid inlet tube and a chemical liquid outlet tube connected to the first and second heat sink blocks, and a plurality of chemical liquid flow path tubes inserted into the insides of the first and second heat sink blocks in such a manner as to communicate with one another and with the chemical liquid inlet tube and the chemical liquid outlet tube, respectively, to flow the chemical liquid therealong.
Public/Granted literature
- US20210213482A1 TEMPERATURE CONTROL DEVICE FOR CHEMICAL LIQUID USED IN SEMICONDUCTOR MANUFACTURING PROCESS Public/Granted day:2021-07-15
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