Invention Grant
- Patent Title: Immersion projection micro stereolithography
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Application No.: US17161742Application Date: 2021-01-29
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Publication No.: US11654617B2Publication Date: 2023-05-23
- Inventor: Chunguang Xia , Alexander Slocum , John Kawola , Jason Bassi
- Applicant: BMF MATERIAL TECHNOLOGY INC.
- Applicant Address: CN Guangdong
- Assignee: BMF MATERIAL TECHNOLOGY INC.
- Current Assignee: BMF MATERIAL TECHNOLOGY INC.
- Current Assignee Address: CN Guangdong
- Agency: Dilworth IP, LLC
- Main IPC: B29C64/124
- IPC: B29C64/124 ; B29C64/209 ; B29C64/245 ; B29C64/232 ; B29C64/286 ; B29C64/393 ; B29C64/364 ; B29C64/236 ; B33Y50/02 ; B33Y10/00 ; B29C64/129

Abstract:
A method for high resolution projection micro stereolithography for 3-D printing comprising: generating a 3D digital model of the sample to be printed in a computer, slicing the digital model into a sequence of images, wherein each of the images of the sequence represents a layer of the 3D digital model, positioning a transparent printing head relative to a resin vat containing a photo-sensitive resin, moving the transparent printing head into position for selectively exposing the photosensitive resin, sending an image from the sequence of images to a LCD or DLP chip, and together with a light source projecting the image through a lens onto the flat tip of the transparent printing head to initiate cure of the photosensitive resin in areas where the projected image allows light from the light source to reach the photosensitive resin.
Public/Granted literature
- US20210237345A1 IMMERSION PROJECTION MICRO STERIOLITHOGRAPHY Public/Granted day:2021-08-05
Information query
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