Invention Grant
- Patent Title: Method of manufacturing cerium dioxide powder and cerium dioxide powder
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Application No.: US14852428Application Date: 2015-09-11
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Publication No.: US11655405B2Publication Date: 2023-05-23
- Inventor: Chung-Hsin Lu , Yong-Jian Liu , Shu-Hao Huang , Chi-Ming Yang
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. , NATIONAL TAIWAN UNIVERSITY
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Company Limited
- Current Assignee: Taiwan Semiconductor Manufacturing Company Limited
- Current Assignee Address: TW Hsin-Chu
- Agency: Cooper Legal Group, LLC
- Priority: TW 3131595 2014.09.12
- Main IPC: C01F17/00
- IPC: C01F17/00 ; C09K3/14 ; C01F17/235

Abstract:
A method of manufacturing a cerium dioxide powder is provided. The method includes mixing a cerium salt, an amine and solvent to form a mixed solution, in which the amine includes a secondary amine, a tertiary amine or a combination thereof, and the tertiary amine is selected from the group consisting of hexamethylenetetramine, triethylenediamine and a combination thereof. A solvothermal reaction of the mixed solution is performed to form the cerium dioxide powder. The cerium dioxide powder manufactured by the method is also provided herein.
Public/Granted literature
- US20160075564A1 METHOD OF MANUFACTURING CERIUM DIOXIDE POWDER AND CERIUM DIOXIDE POWDER Public/Granted day:2016-03-17
Information query
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