Invention Grant
- Patent Title: Process for producing polycrystalline silicon
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Application No.: US17294772Application Date: 2018-12-17
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Publication No.: US11655541B2Publication Date: 2023-05-23
- Inventor: Markus Wenzeis
- Applicant: WACKER CHEMIE AG
- Applicant Address: DE Munich
- Assignee: WACKER CHEMIE AG
- Current Assignee: WACKER CHEMIE AG
- Current Assignee Address: DE Munich
- Agency: Brooks Kushman P.C.
- International Application: PCT/EP2018/085306 2018.12.17
- International Announcement: WO2020/125932A 2020.06.25
- Date entered country: 2021-05-18
- Main IPC: C23C16/52
- IPC: C23C16/52 ; C01B33/03 ; C23C16/24

Abstract:
Polycrystalline silicon is produced in a chemical vapour deposition reactor, wherein, outside the reactor at at least one position on at least one reactor component, vibrations of the reactor are measured using a measurement device and optionally recorded. The vibrations may be used to identify rod fall over and other events occurring within the reactor.
Public/Granted literature
- US20220010434A1 PROCESS FOR PRODUCING POLYCRYSTALLINE SILICON Public/Granted day:2022-01-13
Information query
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