Invention Grant
- Patent Title: Advanced reverse treated electrodeposited copper foil and copper clad laminate using the same
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Application No.: US16899585Application Date: 2020-06-12
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Publication No.: US11655555B2Publication Date: 2023-05-23
- Inventor: Yun-Hsing Sung , Shih-Shen Lee , Hung-Wei Hsu , Chun-Yu Kao
- Applicant: CO-TECH DEVELOPMENT CORP.
- Applicant Address: TW Yun Lin
- Assignee: CO-TECH DEVELOPMENT CORP.
- Current Assignee: CO-TECH DEVELOPMENT CORP.
- Current Assignee Address: TW Yun Lin
- Agency: Li & Cai Intellectual Property Office
- Main IPC: C23D15/00
- IPC: C23D15/00 ; C25D15/00 ; C25D3/38 ; H05K1/02 ; B32B15/04 ; B32B15/20 ; B32B15/01 ; H05K1/09

Abstract:
An advanced reverse treated electrodeposited copper foil and a copper clad laminate using the same are provided. The advanced reverse treated electrodeposited copper foil has an uneven micro-roughened surface. The micro-roughened surface has a plurality of copper crystals, a plurality of copper whiskers and a plurality of copper crystal groups, which are in a non-uniform distribution to form a non-uniformly distributed horizontal or vertical stripe pattern.
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