Invention Grant
- Patent Title: Methods and devices for growing crystals with high uniformity without annealing
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Application No.: US17216659Application Date: 2021-03-29
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Publication No.: US11655557B2Publication Date: 2023-05-23
- Inventor: Yu Wang , Weiming Guan , Zhenxing Liang , Min Li
- Applicant: MEISHAN BOYA ADVANCED MATERIALS CO., LTD.
- Applicant Address: CN Sichuan
- Assignee: MEISHAN BOYA ADVANCED MATERIALS CO., LTD.
- Current Assignee: MEISHAN BOYA ADVANCED MATERIALS CO., LTD.
- Current Assignee Address: CN Meishan
- Agency: Metis IP LLC
- Main IPC: C30B35/00
- IPC: C30B35/00 ; C30B15/02 ; C30B15/22 ; C30B29/22 ; C30B15/10 ; C30B15/14 ; C30B29/28 ; C30B29/34

Abstract:
The present disclosure provides a method for crystal growth. The method may include at one of the following operations: weighing reactants for growing an oxide crystal after a first preprocessing operation is performed on the reactants; placing the reactants, on which a second preprocessing operation has been performed, into a crystal growth device after an assembly preprocessing operation is performed on at least one component of the crystal growth device, wherein the at least one component of the crystal growth device includes a crucible, the assembly preprocessing operation includes at least one of a coating operation, an acid soaking and cleaning operation, or an impurity cleaning operation; introducing a protective gas into the crystal growth device after sealing the crystal growth device; activating the crystal growth apparatus to execute the crystal growth; and adding reactant supplements into the crystal growth device in real-time during the crystal growth.
Public/Granted literature
- US20210381122A1 METHODS AND DEVICES FOR GROWING CRYSTALS WITH HIGH UNIFORMITY WITHOUT ANNEALING Public/Granted day:2021-12-09
Information query
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