Aspects of the present application allow for measurement of a calibrated resistance for a resistive film in a sensing element, such that effects from contact resistance and background resistance drifts due to factors such as temperature, strain or aging can be reduced or eliminated. In some embodiments, by taking a plurality of two-terminal resistance measurements between various pairs of electrodes on a resistive film, a contact-resistance-independent resistance of a reference portion of the resistive film can be determined. Further, a contact-resistance-independent resistance of a sensing portion of the resistive film can be determined based on a plurality of two-terminal resistance measurements between pairs of electrodes. The resistance of the reference portion can be removed from the measured resistance of the sensing portion, such that variations in the reference portion resistance that are not caused by a sensed environmental condition may be compensated.