Invention Grant
- Patent Title: Lithographic apparatus and illumination uniformity correction system
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Application No.: US17605601Application Date: 2020-04-14
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Publication No.: US11656555B2Publication Date: 2023-05-23
- Inventor: Janardan Nath , Kalyan Kumar Mankala , Todd R. Downey , Joseph Harry Lyons , Ozer Unluhisarcikli , Alexander Harris Ledbetter , Nicholas Stephen Apone , Tian Gang
- Applicant: ASML HOLDING N.V. , ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML HOLDING N.V.,ASML NETHERLANDS B V
- Current Assignee: ASML HOLDING N.V.,ASML NETHERLANDS B V
- Current Assignee Address: NL Veldhoven; NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- International Application: PCT/EP2020/060376 2020.04.14
- International Announcement: WO2020/216643A 2020.10.29
- Date entered country: 2021-10-22
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
An illumination adjustment apparatus, to adjust a cross slot illumination of a beam in a lithographic apparatus, includes a plurality of fingers to adjust the cross slot illumination to conform to a selected intensity profile. Each finger has a distal edge that includes at least two segments. The two segments form an indentation of the distal edge.
Public/Granted literature
- US20220214622A1 LITHOGRAPHIC APPARATUS AND ILLUMINATION UNIFORMITY CORRECTION SYSTEM Public/Granted day:2022-07-07
Information query
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