Invention Grant
- Patent Title: Substrate processing apparatus and substrate processing system
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Application No.: US17152833Application Date: 2021-01-20
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Publication No.: US11658054B2Publication Date: 2023-05-23
- Inventor: Noritake Sumi
- Applicant: SCREEN Holdings Co., Ltd.
- Applicant Address: JP Kyoto
- Assignee: SCREEN Holdings Co., Ltd.
- Current Assignee: SCREEN Holdings Co., Ltd.
- Current Assignee Address: JP Kyoto
- Agency: Ostrolenk Faber LLP
- Priority: JP 2020015214 2020.01.31
- Main IPC: H01L21/677
- IPC: H01L21/677 ; H01L21/673

Abstract:
A substrate processing system includes a processing container body having an opening, a lid which closes an opening, a mover for relatively moving the lid with respect to the opening to open and close the opening, and a lock mechanism which locks the lid to the processing container body. The lock mechanism includes an arm member and a locking member. The arm member is provided on one of the processing container body and the lid and extends toward the other when the processing container body is located at a position where the lid is separated from the processing container body. The locking member restricts a displacement of the arm member by being engaged with a part of the arm member. This part is located beyond the gap space when the lid is at the separated position.
Public/Granted literature
- US20210242058A1 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING SYSTEM Public/Granted day:2021-08-05
Information query
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