Invention Grant
- Patent Title: Semiconductor storage device
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Application No.: US17007797Application Date: 2020-08-31
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Publication No.: US11658155B2Publication Date: 2023-05-23
- Inventor: Masashi Yamaoka , Kazuhiro Tomishige , Naoki Yamamoto
- Applicant: KIOXIA CORPORATION
- Applicant Address: JP Tokyo
- Assignee: KIOXIA CORPORATION
- Current Assignee: KIOXIA CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Foley & Lardner LLP
- Priority: JP 2020009505 2020.01.23
- Main IPC: H01L27/1157
- IPC: H01L27/1157 ; H01L25/065 ; H01L23/538 ; G11C16/04 ; G11C5/06

Abstract:
A semiconductor storage device includes a substrate, a plurality of conductive layers arranged in a first direction intersecting a surface of the substrate, and a semiconductor layer extending in the first direction and penetrating the plurality of conductive layers. The plurality of conductive layers includes a first conductive layer and a second conductive layer that are adjacent to each other, a third conductive layer and a fourth conductive layer that are adjacent to each other, and a fifth conductive layer and a sixth conductive layer that are adjacent to each other. When a distance between the first conductive layer and the second conductive layer in the first direction is a first distance, a distance between the third conductive layer and the fourth conductive layer in the first direction is a second distance, and a distance between the fifth conductive layer and the sixth conductive layer in the first direction is a third distance, the second distance is smaller than the first distance, and the third distance is smaller than the second distance.
Public/Granted literature
- US20210233895A1 SEMICONDUCTOR STORAGE DEVICE Public/Granted day:2021-07-29
Information query
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