Invention Grant
- Patent Title: Field effect transistor based on graphene nanoribbon and method for making the same
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Application No.: US17206786Application Date: 2021-03-19
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Publication No.: US11658232B2Publication Date: 2023-05-23
- Inventor: Tian-Fu Zhang , Li-Hui Zhang , Yuan-Hao Jin , Qun-Qing Li , Shou-Shan Fan
- Applicant: Tsinghua University , HON HAI PRECISION INDUSTRY CO., LTD.
- Applicant Address: CN Beijing
- Assignee: Tsinghua University,HON HAI PRECISION INDUSTRY CO., LTD.
- Current Assignee: Tsinghua University,HON HAI PRECISION INDUSTRY CO., LTD.
- Current Assignee Address: CN Beijing; TW New Taipei
- Agency: ScienBiziP, P.C.
- Priority: CN 2011447903.6 2020.12.09
- Main IPC: H01L29/76
- IPC: H01L29/76 ; H01L29/06 ; H01L29/16 ; H01L29/417 ; H01L29/423 ; H01L29/786 ; H01L29/66 ; H01L21/02 ; H01L21/78 ; H01L21/04

Abstract:
A method for making a field effect transistor includes providing a graphene nanoribbon composite structure. The graphene nanoribbon composite structure includes a substrate and a plurality of graphene nanoribbons spaced apart from each other. The plurality of graphene nanoribbons are located on the substrate and extend substantially along a same direction, and each of the plurality of graphene nanoribbons includes a first end and a second end opposite to the first end. A source electrode is formed on the first end, and a drain electrode is formed on the second end. The source electrode and the drain electrode are electrically connected to the plurality of graphene nanoribbons. An insulating layer is formed on the plurality of graphene nanoribbons, and the plurality of graphene nanoribbons are between the insulating layer and the substrate. A gate is formed on a surface of the insulating layer away from the substrate.
Public/Granted literature
- US20220181475A1 FIELD EFFECT TRANSISTOR AND METHOD FOR MAKING THE SAME Public/Granted day:2022-06-09
Information query
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