Invention Grant
- Patent Title: Device for applying magnetic field to a filter for reducing metallic contaminants
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Application No.: US16548532Application Date: 2019-08-22
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Publication No.: US11666838B2Publication Date: 2023-06-06
- Inventor: Hsuan-Ying Mai , Hui-Chun Lee , Chun-Kuang Chen , Tung-Hung Feng
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: McDermott Will & Emery LLP
- Main IPC: B01D35/06
- IPC: B01D35/06 ; B01D35/30 ; B03C1/28 ; B03C1/30

Abstract:
A filter is used for removing metallic contaminants in a solvent used in microcircuit fabrication. The filter includes a filter housing including a filter membrane for filtering solvent including metallic contaminants, and a magnet arranged about the filter housing and configured to generate a magnetic field to attract the metallic contaminants prior to the metallic contaminants entering the filter membrane. The magnet is arranged such that the magnetic field of the magnet is greater in a periphery of the filter housing compared to a central portion of the filter housing.
Information query
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