Invention Grant
- Patent Title: Vortex ring generation device
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Application No.: US17226701Application Date: 2021-04-09
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Publication No.: US11666928B2Publication Date: 2023-06-06
- Inventor: Chiho Fujii , Chie Emura , Yousuke Imai
- Applicant: DAIKIN INDUSTRIES, LTD.
- Applicant Address: JP Osaka
- Assignee: Daikin Industries, Ltd.
- Current Assignee: Daikin Industries, Ltd.
- Current Assignee Address: JP Osaka
- Agency: Global IP Counselors, LLP
- Priority: JP 2018193429 2018.10.12
- Main IPC: B05B1/06
- IPC: B05B1/06 ; F24F13/06 ; A61L9/12

Abstract:
A vortex ring generation device includes a casing and an extrusion mechanism. The casing has a gas passage and a discharge port. The extrusion mechanism extrudes gas in the gas passage such that the gas in a vortex ring shape is discharged from the discharge port. V (m3) represents an extrusion volume, D (m) represents a diameter of the discharge port, L (m) represents a length of a cylinder having the diameter D and the volume V, and U (m/s) represents a discharge flow rate 0.045≤D≤0.135, 0.15≤L≤0.35, and 3≤U≤5.
Public/Granted literature
- US20210220844A1 VORTEX RING GENERATION DEVICE Public/Granted day:2021-07-22
Information query
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