Invention Grant
- Patent Title: Deposition system with a multi-cathode
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Application No.: US17552505Application Date: 2021-12-16
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Publication No.: US11668003B2Publication Date: 2023-06-06
- Inventor: Vibhu Jindal , Sanjay Bhat
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: H01J37/34
- IPC: H01J37/34 ; C23C14/35 ; C23C14/04 ; C23C14/34 ; C23C14/18
Abstract:
A deposition system, and a method of operation thereof are disclosed. The deposition system comprises a cathode assembly comprising a rotating magnet assembly including a plurality of outer peripheral magnets surrounding an inner peripheral magnet.
Public/Granted literature
- US20220106679A1 DEPOSITION SYSTEM WITH A MULTI-CATHODE Public/Granted day:2022-04-07
Information query
