Invention Grant
- Patent Title: Apparatus and method for detecting wavefront aberration of objective lens
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Application No.: US17472047Application Date: 2021-09-10
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Publication No.: US11668625B2Publication Date: 2023-06-06
- Inventor: Peng Li , Feng Tang , Xiangzhao Wang , Yunjun Lu , Yang Liu , Xiangyu Wei , Yisha Cao , Changzhe Peng
- Applicant: Shanghai Institute of Optics And Fine Mechanics, Chinese Academy of Sciences
- Applicant Address: CN Shanghai
- Assignee: Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences
- Current Assignee: Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences
- Current Assignee Address: CN Shanghai
- Agency: Mei & Mark LLP
- Agent Manni Li
- Priority: CN 2110302284.X 2021.03.22
- Main IPC: G01B11/02
- IPC: G01B11/02 ; G01M11/02 ; G01B9/0209 ; G02B5/08

Abstract:
Apparatus and method for detecting wavefront aberration of an objective lens, comprising a wavefront detection system, a planar mirror, and a planar mirror adjusting mechanism; the objective lens is placed between planar mirror and wavefront detection system; planar mirror is positioned at focal point of the objective lens. A test wavefront emitted by wavefront detection system passes through the objective lens, gets reflected by the planar mirror, and t passes through the objective lens again; the wavefront detection system receives and detects the test wavefront to derive a phase distribution thereof; an angle of the planar mirror tilts at is adjusted to obtain different return wavefronts; a polynomial for expressing wavefront aberration is selected, and expressions corresponding to all the return wavefronts are calculated; result of fitting the wavefront aberration of the objective lens when expressed by the selected polynomial is derived through fitting with the polynomial.
Public/Granted literature
- US20220299402A1 APPARATUS AND METHOD FOR DETECTING WAVEFRONT ABERRATION OF OBJECTIVE LENS Public/Granted day:2022-09-22
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