Invention Grant
- Patent Title: Method for processing a substrate by using fluid flowing through a particle detector
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Application No.: US17228656Application Date: 2021-04-12
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Publication No.: US11668639B2Publication Date: 2023-06-06
- Inventor: En-Tian Lin , Chwen Yu , Mei Lee , Shu-Yu Hsu
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: JCIPRNET
- Main IPC: G01R1/04
- IPC: G01R1/04 ; G01R1/067 ; G01R1/073 ; G01N15/10 ; G01N15/12 ; G01N27/00 ; G01N33/28 ; G01N21/00 ; H01L21/67 ; G01N15/00

Abstract:
A method for processing a substrate by using fluid flowing through a particle detector is provided. The particle detector is utilized to detect nano-particles contained in fluid. The particle detector includes a substrate and a pair of sensing electrodes disposed on the substrate. The substrate includes nano-pores, wherein the pore size of the nano-pores is greater than the particle size of the nano-particles, allowing the nano-particles contained in the fluid passing through the nano-pores. The pair of sensing electrodes are positioned adjacent to at least one of the nano-pores.
Public/Granted literature
- US20210231553A1 METHOD FOR PROCESSING A SUBSTRATE BY USING FLUID FLOWING THROUGH A PARTICLE DETECTOR Public/Granted day:2021-07-29
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