Invention Grant
- Patent Title: Clothing pattern making management system
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Application No.: US16895280Application Date: 2020-06-08
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Publication No.: US11669603B2Publication Date: 2023-06-06
- Inventor: Jui-Wen Wang , Chia-Hua Chang , Chun-Lung Ho
- Applicant: KWONG LUNG ENTERPRISE CO., LTD.
- Applicant Address: TW Taipei
- Assignee: KWONG LUNG ENTERPRISE CO., LTD.
- Current Assignee: KWONG LUNG ENTERPRISE CO., LTD.
- Current Assignee Address: TW Taipei
- Agency: Rabin & Berdo, P.C.
- Main IPC: A41H3/00
- IPC: A41H3/00 ; G06F21/31 ; G06F18/2431

Abstract:
A clothing pattern making management system, applicable to a server and used for allowing users to connect and manage a plurality of clothing pattern making data via a network, at least including a database and a login and authority management module, a search and viewing module, a connection and upload module, and a management and download module. Through the data connection to a business system, the system is able to facilitate the users to perform data upload and management in order to achieve proper preservation and management of a large quantity of pattern drawings for various styles of clothes and for all stages, and to achieve the effects of learning exchange and passing on of techniques.
Public/Granted literature
- US20210378339A1 CLOTHING PATTERN MAKING MANAGEMENT SYSTEM Public/Granted day:2021-12-09
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