Invention Grant
- Patent Title: Substrate defect inspection method, storage medium, and substrate defect inspection apparatus
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Application No.: US17252151Application Date: 2019-06-10
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Publication No.: US11669955B2Publication Date: 2023-06-06
- Inventor: Shin Inoue , Kazuya Hisano , Akiko Kiyotomi , Tadashi Nishiyama
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Posz Law Group, PLC
- Priority: JP 2018117798 2018.06.21
- International Application: PCT/JP2019/022944 2019.06.10
- International Announcement: WO2019/244696A 2019.12.26
- Date entered country: 2020-12-14
- Main IPC: G06T7/00
- IPC: G06T7/00 ; G03F7/16

Abstract:
Defects of substrates are inspected when executing a job in which a treatment recipe for substrates and the substrates being treatment objects are designated to perform predetermined treatments on the substrates. An imaging step successively images substrates. A first determination step decomposes, in order from the substrate as head of the job, a planar distribution of pixel values in a substrate image captured at the imaging step into pixel value distribution components using a Zernike polynomial, calculates Zernike coefficients of the pixel value distribution components corresponding to defects to be detected, and determines presence or absence of a defect based on the calculated Zernike coefficients. A second determination step determines, from predetermined timing after one or more substrates is determined to have no defect at the first determination step, presence or absence of a defect based on the substrate image determined to have no defect at the first determination step.
Public/Granted literature
- US20210166365A1 SUBSTRATE DEFECT INSPECTION METHOD, STORAGE MEDIUM, AND SUBSTRATE DEFECT INSPECTION APPARATUS Public/Granted day:2021-06-03
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