Invention Grant
- Patent Title: Semiconductor device structure with resistive elements
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Application No.: US17219173Application Date: 2021-03-31
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Publication No.: US11670501B2Publication Date: 2023-06-06
- Inventor: Hsiu-Wen Hsueh , Yu-Hsiang Chen , Wen-Sheh Huang , Chii-Ping Chen , Wan-Te Chen
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L21/762 ; H01L27/06 ; H01L23/64 ; H01L21/304 ; H01L27/08 ; H01L23/522 ; H01L49/02 ; H01L23/528 ; H01L23/34

Abstract:
A semiconductor device structure is provided. The semiconductor device structure includes a semiconductor substrate, a first resistive element and a second resistive element over the semiconductor substrate. A topmost surface of the second resistive element is higher than a topmost surface of the first resistive element. The semiconductor device structure also includes a first conductive feature and a second conductive feature electrically connected to the first resistive element. The second resistive element is between and electrically isolated from the first conductive feature and the second conductive feature. The semiconductor device structure further includes a first dielectric layer surrounding the first conductive feature and the second conductive feature.
Public/Granted literature
- US20210249251A1 SEMICONDUCTOR DEVICE STRUCTURE WITH RESISTIVE ELEMENTS Public/Granted day:2021-08-12
Information query
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