Invention Grant
- Patent Title: Processing liquid generator and substrate processing apparatus using the same
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Application No.: US15661480Application Date: 2017-07-27
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Publication No.: US11670522B2Publication Date: 2023-06-06
- Inventor: Konosuke Hayashi , Kunihiro Miyazaki
- Applicant: SHIBAURA MECHATRONICS CORPORATION
- Applicant Address: JP Yokohama
- Assignee: SHIBAURA MECHATRONICS CORPORATION
- Current Assignee: SHIBAURA MECHATRONICS CORPORATION
- Current Assignee Address: JP Yokohama
- Agency: Kratz, Quintos & Hanson, LLP
- Priority: JP 2016150832 2016.07.29 JP 2017124215 2017.06.26
- Main IPC: H01L21/67
- IPC: H01L21/67

Abstract:
According to one embodiment, a processing liquid generator capable of improving the reliability of the concentration of generated processing liquid is provided.
A processing liquid generator that generates processing liquid having undergone concentration adjustment includes a processing liquid adjuster (11a), which adjusts the concentration of the processing liquid, a first processing liquid path P1, through which the processing liquid flows to the processing liquid adjuster (11a), a second processing liquid path P2, through which the processing liquid flows to the processing liquid adjuster 11a, a first concentration meter 201a, which measures the concentration of the processing liquid flowing through the first processing liquid path P1, the measured concentration being the concentration of a component involved in the concentration adjustment in the processing liquid adjuster (11a), a second concentration meter 201b, which measures the concentration of the processing liquid flowing through the second processing liquid path P2, the measured concentration being the concentration of a component that is involved in the concentration adjustment and should be measured with the first concentration meter 201a in terms of concentration, a first valve mechanism 120a/130a, which opens and closes the first processing liquid path P1, and a second valve mechanism 120b/130b, which opens and closes the second processing liquid path P2.
A processing liquid generator that generates processing liquid having undergone concentration adjustment includes a processing liquid adjuster (11a), which adjusts the concentration of the processing liquid, a first processing liquid path P1, through which the processing liquid flows to the processing liquid adjuster (11a), a second processing liquid path P2, through which the processing liquid flows to the processing liquid adjuster 11a, a first concentration meter 201a, which measures the concentration of the processing liquid flowing through the first processing liquid path P1, the measured concentration being the concentration of a component involved in the concentration adjustment in the processing liquid adjuster (11a), a second concentration meter 201b, which measures the concentration of the processing liquid flowing through the second processing liquid path P2, the measured concentration being the concentration of a component that is involved in the concentration adjustment and should be measured with the first concentration meter 201a in terms of concentration, a first valve mechanism 120a/130a, which opens and closes the first processing liquid path P1, and a second valve mechanism 120b/130b, which opens and closes the second processing liquid path P2.
Public/Granted literature
- US20180033651A1 PROCESSING LIQUID GENERATOR AND SUBSTRATE PROCESSING APPARATUS USING THE SAME Public/Granted day:2018-02-01
Information query
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