Invention Grant
- Patent Title: Fully automated wafer debonding system and method thereof
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Application No.: US17110122Application Date: 2020-12-02
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Publication No.: US11670524B2Publication Date: 2023-06-06
- Inventor: Cheng-Fei Yu , Chang-Chen Tsao , Ting-Yau Shiu , Cheng-Kang Hu , Hsu-Shui Liu , Jiun-Rong Pai
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Duane Morris LLP
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L21/67 ; H01L23/00 ; B32B43/00 ; H01L21/66

Abstract:
An apparatus and method for debonding a pair of bonded wafers are disclosed herein. In some embodiments, the debonding apparatus, comprises: a wafer chuck having a preset maximum lateral dimension and configured to rotate the pair of bonded wafers attached to a top surface of the wafer chuck, a pair of circular plate separating blades including a first separating blade and a second separating blade arranged diametrically opposite to each other at edges of the pair of bonded wafers, wherein the first and the second separating blades are inserted between a first and a second wafers of the pair of bonded wafers, and at least two pulling heads configured to pull the second wafer upwardly so as to debond the second wafer from the first wafer.
Public/Granted literature
- US20210242043A1 FULLY AUTOMATED WAFER DEBONDING SYSTEM AND METHOD THEREOF Public/Granted day:2021-08-05
Information query
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