Invention Grant
- Patent Title: Semiconductor transistor device and method of manufacturing the same
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Application No.: US17163780Application Date: 2021-02-01
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Publication No.: US11670684B2Publication Date: 2023-06-06
- Inventor: Li Juin Yip , Oliver Blank , Heimo Hofer , Michael Hutzler , Ralf Siemieniec
- Applicant: Infineon Technologies Austria AG
- Applicant Address: AT Villach
- Assignee: Infineon Technologies Austria AG
- Current Assignee: Infineon Technologies Austria AG
- Current Assignee Address: AT Villach
- Agency: Murphy, Bilak & Homiller, PLLC
- Priority: EP 156150 2020.02.07
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/10 ; H01L29/78

Abstract:
The application relates to a semiconductor transistor device, having a source region, a body region including a channel region extending in a vertical direction, a drain region, a gate region arranged aside the channel region in a lateral direction, and a body contact region made of an electrically conductive material, wherein the body contact region forms a body contact area, the body contact region being in an electrical contact with the body region via the body contact area, and wherein the body contact area is tilted with respect to the vertical direction and the lateral direction.
Public/Granted literature
- US20210249510A1 Semiconductor Transistor Device and Method of Manufacturing the Same Public/Granted day:2021-08-12
Information query
IPC分类: