Invention Grant
- Patent Title: Gallium nitride substrate and manufacturing method of nitride semiconductor crystal
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Application No.: US16906714Application Date: 2020-06-19
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Publication No.: US11670687B2Publication Date: 2023-06-06
- Inventor: Yusuke Tsukada , Shuichi Kubo , Kazunori Kamada , Hideo Fujisawa , Tatsuhiro Ohata , Hirotaka Ikeda , Hajime Matsumoto , Yutaka Mikawa
- Applicant: MITSUBISHI CHEMICAL CORPORATION
- Applicant Address: JP Tokyo
- Assignee: MITSUBISHI CHEMICAL CORPORATION
- Current Assignee: MITSUBISHI CHEMICAL CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP 12275035 2012.12.17 JP 13072629 2013.03.29 JP 13114619 2013.05.30
- Main IPC: H01L29/20
- IPC: H01L29/20 ; C30B25/00 ; C30B25/02 ; C30B29/40 ; H01L21/02 ; H01L33/00 ; H01L29/32 ; C30B25/20 ; H01L33/32 ; H01L33/12

Abstract:
A gallium nitride substrate comprising a first main surface and a second main surface opposite thereto, wherein the first main surface is a non-polar or semi-polar plane, a dislocation density measured by a room-temperature cathode luminescence method in the first main surface is 1×104 cm−2 or less, and an averaged dislocation density measured by a room-temperature cathode luminescence method in an optional square region sizing 250 μm×250 μm in the first main plan is 1×106 cm−2 or less.
Public/Granted literature
- US20200321438A1 GALLIUM NITRIDE SUBSTRATE AND MANUFACTURING METHOD OF NITRIDE SEMICONDUCTOR CRYSTAL Public/Granted day:2020-10-08
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