Invention Grant
- Patent Title: Trench gate field-effect transistors with drain runner
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Application No.: US17248512Application Date: 2021-01-28
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Publication No.: US11670693B2Publication Date: 2023-06-06
- Inventor: Mitsuru Soma
- Applicant: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
- Applicant Address: US AZ Phoenix
- Assignee: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
- Current Assignee: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
- Current Assignee Address: US AZ Scottsdale
- Agency: Brake Hughes Bellermann LLP
- Main IPC: H01L29/417
- IPC: H01L29/417 ; H01L29/40 ; H01L29/66 ; H01L21/265 ; H01L21/765 ; H01L29/78

Abstract:
In a general aspect, a field-effect transistor (FET) can include a semiconductor region, and a trench disposed in the semiconductor region. The FET can also include a trench gate disposed in an upper portion of the trench in an active region of the FET. The FET can further include a conductive runner disposed in a bottom portion of the trench. The conductive runner can be electrically coupled with a drain terminal of the FET. A portion of the conductive runner can be disposed in the active region below the trench gate.
Public/Granted literature
- US20220238664A1 TRENCH GATE FIELD-EFFECT TRANSISTORS WITH DRAIN RUNNER Public/Granted day:2022-07-28
Information query
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