A filter apparatus is disclosed. The filter apparatus may include a plurality of dielectric layers. The plurality of dielectric layers may include one or more first dielectric layers formed of a first dielectric material and one or more second dielectric layers formed of a second dielectric material. The second dielectric material of the one or more second dielectric layers being different than the first dielectric material of the one or more first dielectric layers. The filter apparatus may further include one or more thin-film metal layers arranged between at least one dielectric layer of the plurality of dielectric layers and an additional dielectric layer of the plurality of dielectric layers.