Invention Grant
- Patent Title: Narrow-pulse-width pulse laser
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Application No.: US17821322Application Date: 2022-08-22
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Publication No.: US11670906B2Publication Date: 2023-06-06
- Inventor: Hongpeng Li , Baige Wang , Ruitong Zheng , Luofeng Shen
- Applicant: Tanway Technology (Beijing) Co., Ltd
- Applicant Address: CN Beijing
- Assignee: Tanway Technology (Beijing) Co., Ltd
- Current Assignee: Tanway Technology (Beijing) Co., Ltd
- Current Assignee Address: CN Beijing
- Agency: Jaffery Watson Mendonsa & Hamilton LLP
- Priority: CN 2111108969.7 2021.09.22
- Main IPC: H01S5/042
- IPC: H01S5/042 ; H01S5/062

Abstract:
The present disclosure provides a narrow-pulse-width pulse laser, including a circuit substrate, a laser chip, one or more capacitors, and a field effect transistor. Each of the field effect transistor, the capacitor, and the laser chip is electrically connected to the circuit substrate. The capacitors are arranged between the field effect transistor and the laser chip along an extension direction of a gap between the field effect transistor and the laser chip. The circuit substrate may include a first conductor layer; a second conductor layer; and an insulating layer arranged between the first conductor layer and the second conductor layer, wherein the first conductor layer and the second conductor layer are electrically connected through a via hole in the insulating layer.
Public/Granted literature
- US20230093567A1 NARROW-PULSE-WIDTH PULSE LASER Public/Granted day:2023-03-23
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