Invention Grant
- Patent Title: Semiconductor storage device
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Application No.: US17007675Application Date: 2020-08-31
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Publication No.: US11672113B2Publication Date: 2023-06-06
- Inventor: Kaihei Kato , Takashi Fukushima , Kazutaka Suzuki
- Applicant: Kioxia Corporation
- Applicant Address: JP Tokyo
- Assignee: KIOXIA CORPORATION
- Current Assignee: KIOXIA CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Foley & Lardner LLP
- Priority: JP 2019213410 2019.11.26
- Main IPC: H01L27/11575
- IPC: H01L27/11575 ; H01L27/11556 ; G11C5/06 ; G11C5/02 ; H01L27/11582

Abstract:
A semiconductor storage device includes a substrate having a surface, a first conductive layer 25 disposed on a substrate and extending in an X direction parallel to the surface of the substrate; a second conductive layer 25 that disposed on the first conductive layer 25 and extending in the X direction; an insulation plug 30 disposed on the substrate, extends in a Z direction intersecting with the X direction, and intersects with the first conductive layer 25; and a contact plug CC disposed on the first insulation plug 30, extends in the Z direction, and intersects with the second conductive layer 25.
Public/Granted literature
- US20210159239A1 SEMICONDUCTOR STORAGE DEVICE Public/Granted day:2021-05-27
Information query
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