Invention Grant
- Patent Title: Method for machining synthetic quartz glass substrate
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Application No.: US17494262Application Date: 2021-10-05
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Publication No.: US11673385B2Publication Date: 2023-06-13
- Inventor: Masao Ando , Hiroyuki Yamazaki
- Applicant: Shin-Etsu Chemical Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP 2020179551 2020.10.27
- Main IPC: B32B38/00
- IPC: B32B38/00 ; B32B37/12 ; B32B17/10 ; B32B3/26 ; B32B7/12

Abstract:
A synthetic quartz glass substrate is machined by bringing a surface of the synthetic quartz glass substrate as the workpiece into contact with and superposing it on a surface of a protective member made of synthetic quartz glass to effect optical contact bonding of the workpiece and the protective member, and passing a cutting tool through the optical contact bonding surfaces. This machining process is able to effectively prevent the generation of microdefects at the cutting tool entry site and extraction site during a cutting operation. Moreover, a fixing agent is not used to join the workpiece and the protective member, and so productivity is high because there is no need for the application and later removal of a fixing agent.
Public/Granted literature
- US20220126558A1 METHOD FOR MACHINING SYNTHETIC QUARTZ GLASS SUBSTRATE Public/Granted day:2022-04-28
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