Invention Grant
- Patent Title: Microstructure and method for manufacturing same
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Application No.: US17192126Application Date: 2021-03-04
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Publication No.: US11673797B2Publication Date: 2023-06-13
- Inventor: Shinan Wang
- Applicant: Shanghai Industrial μTechnology Research Institute
- Applicant Address: CN Shanghai
- Assignee: SHANGHAI INDUSTRIAL UTECHNOLOGY RESEARCH INSTITUTE
- Current Assignee: SHANGHAI INDUSTRIAL UTECHNOLOGY RESEARCH INSTITUTE
- Current Assignee Address: CN Shanghai
- Agency: Global IP Services
- Agent Tianhua Gu
- Priority: CN 2010163710.1 2020.03.10
- Main IPC: B81C1/00
- IPC: B81C1/00 ; B81B1/00 ; G01L9/00

Abstract:
A microstructure and a method for manufacturing the same includes: disposing a liquid film on a surface of a substrate, wherein a solid-liquid interface is formed where the liquid film is in contact with the substrate; and irradiating the substrate with a laser of a predetermined waveband to etch the substrate at the solid-liquid interface, wherein the position where the laser is irradiated on the solid-liquid interface moves at least along a direction parallel to the surface of the substrate, and the absorption rate of the liquid film for the laser is greater than the absorption rate of the substrate for the laser.
Public/Granted literature
- US20210284528A1 MICROSTRUCTURE AND METHOD FOR MANUFACTURING SAME Public/Granted day:2021-09-16
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