Invention Grant
- Patent Title: Carbon nanostructured materials and methods for forming carbon nanostructured materials
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Application No.: US17251547Application Date: 2018-06-11
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Publication No.: US11673807B2Publication Date: 2023-06-13
- Inventor: Rok Zaplotnik , Miran Mozetic , Gregor Primc , Alenka Vesel , Masaru Hori
- Applicant: Jo{hacek over (z)}ef Stefan Institute , NATIONAL UNIVERSITY CORPORATION TOKAI NATIONAL HIGHER EDUCATION AND RESEARCH SYSTEM
- Applicant Address: SI Ljubljana
- Assignee: National University Corporation Tokai National Higher Education and Research System
- Current Assignee: National University Corporation Tokai National Higher Education and Research System
- Current Assignee Address: JP Nagoya
- Agency: Ziegler IP Law Group LLC
- International Application: PCT/EP2018/065365 2018.06.11
- International Announcement: WO2019/238206A 2019.12.19
- Date entered country: 2020-12-11
- Main IPC: C01B32/18
- IPC: C01B32/18 ; B82Y30/00 ; B82Y40/00

Abstract:
The present disclosure relates to methods for depositing vertically oriented carbon nanowalls (CNWs) using non-equilibrium gases such as gaseous plasma. Methods are disclosed for rapid deposition of uniformly distributed nanowalls on large surfaces of substrates using ablation of bulk carbon materials by reactive gaseous species, formation of oxidized carbon-containing gaseous molecules, ionization of said molecules and interacting said molecules, neutral or positively charged, with a substrate. The CNWs prepared are useful in different applications such as fuel cells, lithium ion batteries, photovoltaic devices and sensors of specific gaseous molecules.
Public/Granted literature
- US20210253430A1 CARBON NANOSTRUCTURED MATERIALS AND METHODS FOR FORMING CARBON NANOSTRUCTURED MATERIALS Public/Granted day:2021-08-19
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