Invention Grant
- Patent Title: Resist composition and method for producing resist pattern
-
Application No.: US17186184Application Date: 2021-02-26
-
Publication No.: US11675267B2Publication Date: 2023-06-13
- Inventor: Yuji Kita , Nobuhiko Nishitani , Koji Ichikawa
- Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Buchanan, Ingersoll & Rooney PC
- Priority: JP 2020050973 2020.03.23 JP 2020171045 2020.10.09
- Main IPC: G03F7/038
- IPC: G03F7/038 ; C08F212/14 ; C08F220/28 ; C08F220/18 ; G03F7/004 ; G03F7/16 ; G03F7/38
Abstract:
Disclosed is a resist composition including a compound represented by formula (I), a resin having an acid-labile group and an acid generator, the resin having an acid-labile group including at least one selected from the group consisting of a structural unit represented by formula (a1-1) and a structural unit represented by formula (a1-2):
Public/Granted literature
- US20210311392A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN Public/Granted day:2021-10-07
Information query
IPC分类:
