- Patent Title: Thin film capacitor having a dielectric layer having a through hole whose inner surface has first and second tapered surfaces, circuit board incorporating the same, and thin film capacitor manufacturing method
-
Application No.: US17165339Application Date: 2021-02-02
-
Publication No.: US11676767B2Publication Date: 2023-06-13
- Inventor: Yuuki Aburakawa , Tatsuo Namikawa , Akiyasu Iioka , Hitoshi Saita , Kazuhiro Yoshikawa
- Applicant: TDK CORPORATION
- Applicant Address: JP Tokyo
- Assignee: TDK CORPORATION
- Current Assignee: TDK CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Young Law Firm, P.C.
- Priority: JP 2020031758 2020.02.27
- Main IPC: H01G4/33
- IPC: H01G4/33 ; H01G4/008 ; H01G4/30 ; H01L23/498 ; H01L23/64 ; H01G4/12

Abstract:
Disclosed herein a thin film capacitor that includes a lower electrode layer, an upper electrode layer, and a dielectric layer disposed between the lower electrode layer and the upper electrode layer. The dielectric layer has a through hole. An inner wall surface of the through hole has a first tapered surface and a second tapered surface surrounded by the first tapered surface. The first and second tapered surfaces are not covered with the upper electrode layer and have respective first and second taper angles with respect to a surface of the lower electrode layer. The second taper angle is smaller than the first taper angle.
Public/Granted literature
- US20210272757A1 THIN FILM CAPACITOR, CIRCUIT BOARD INCORPORATING THE SAME, AND THIN FILM CAPACITOR MANUFACTURING METHOD Public/Granted day:2021-09-02
Information query