Invention Grant
- Patent Title: Substrate placing table and substrate processing apparatus
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Application No.: US18047248Application Date: 2022-10-17
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Publication No.: US11676847B2Publication Date: 2023-06-13
- Inventor: Satoshi Taga , Naoyuki Satoh , Tatsuo Nishita
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Studebaker & Brackett PC
- Priority: JP 18244752 2018.12.27 JP 19203311 2019.11.08
- Main IPC: H01L21/683
- IPC: H01L21/683 ; C23C4/134 ; H01J37/32

Abstract:
A substrate placing table according to an exemplary embodiment includes a base and an electrostatic chuck provided on the base. The electrostatic chuck includes a lamination layer portion, an intermediate layer, and a covering layer. The lamination layer portion is provided on the base. The intermediate layer is provided on the lamination layer portion. The covering layer is provided on the intermediate layer. The lamination layer portion includes a first layer, an electrode layer, and a second layer. The first layer is provided on the base. The electrode layer is provided on the first layer. The second layer is provided on the electrode layer. The intermediate layer is provided between the second layer and the covering layer and is in close contact with the second layer and the covering layer. The second layer is a resin layer. The covering layer is ceramics.
Public/Granted literature
- US20230065448A1 SUBSTRATE PLACING TABLE AND SUBSTRATE PROCESSING APPARATUS Public/Granted day:2023-03-02
Information query
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