Invention Grant
- Patent Title: Manufacturing method for semiconductor device
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Application No.: US17050113Application Date: 2019-03-27
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Publication No.: US11676936B2Publication Date: 2023-06-13
- Inventor: Ryota Mita , Tomoaki Ichikawa
- Applicant: NITTO DENKO CORPORATION
- Applicant Address: JP Ibaraki
- Assignee: NITTO DENKO CORPORATION
- Current Assignee: NITTO DENKO CORPORATION
- Current Assignee Address: JP Ibaraki
- Agency: Sughrue Mion, PLLC
- Priority: JP 2018086475 2018.04.27 JP 2018168832 2018.09.10
- International Application: PCT/JP2019/013138 2019.03.27
- International Announcement: WO2019/208071A 2019.10.31
- Date entered country: 2020-10-23
- Main IPC: H01L23/00
- IPC: H01L23/00 ; H01L21/48 ; H01L21/56 ; H01L21/683 ; H01L21/78

Abstract:
A manufacturing method includes the step of forming a diced semiconductor wafer (10) including semiconductor chips (11) from a semiconductor wafer (W) typically on a dicing tape (T1). The diced semiconductor wafer (10) on the dicing tape (T1) is laminated with a sinter-bonding sheet (20). The semiconductor chips (11) each with a sinter-bonding material layer (21) derived from the sinter-bonding sheet (20) are picked up typically from the dicing tape (T1). The semiconductor chips (11) each with the sinter-bonding material layer are temporarily secured through the sinter-bonding material layer (21) to a substrate. Through a heating process, sintered layers are formed from the sinter-bonding material layers (21) lying between the temporarily secured semiconductor chips (11) and the substrate, to bond the semiconductor chips (11) to the substrate. The semiconductor device manufacturing method is suitable for efficiently supplying a sinter-bonding material to individual semiconductor chips while reducing loss of the sinter-bonding material.
Public/Granted literature
- US20210098418A1 MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE Public/Granted day:2021-04-01
Information query
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