Invention Grant
- Patent Title: Substrate positioning for deposition machine
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Application No.: US16915614Application Date: 2020-06-29
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Publication No.: US11679602B2Publication Date: 2023-06-20
- Inventor: Karl Mathia , Jesse Lu , Jerry Chang , Matt Audet , Stephen Baca , Vadim Mashevsky , David C. Darrow
- Applicant: Kateeva, Inc.
- Applicant Address: US CA Newark
- Assignee: Kateeva, Inc.
- Current Assignee: Kateeva, Inc.
- Current Assignee Address: US CA Newark
- Agency: Hauptman Ham, LLP
- Main IPC: B41J3/28
- IPC: B41J3/28 ; B41J11/42 ; B41J11/00 ; H05K3/12 ; B41J3/407
Abstract:
A deposition device is described. The deposition device has a substrate support and a laser imaging system disposed to image a portion of a substrate positioned on the substrate support. The laser imaging system comprises a laser source and an imaging unit, and is coupled to a deposition assembly disposed across the substrate support.
Public/Granted literature
- US20210010136A1 SUBSTRATE POSITIONING FOR DEPOSITION MACHINE Public/Granted day:2021-01-14
Information query
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