Embodiments of the present disclosure provide systems and methods for enhancing the semiconductor manufacturing yield. Embodiments of the present disclosure provide a yield improvement system. The system comprises a training tool configured to generate training data based on receipt of one or more verified results of an inspection of a first substrate. The system also comprises a point determination tool configured to determine one or more regions on a second substrate to inspect based on the training data, weak point information for the second substrate, and an exposure recipe for a scanner of the second substrate.