Invention Grant
- Patent Title: Semiconductor device and method of manufacture
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Application No.: US17246035Application Date: 2021-04-30
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Publication No.: US11682602B2Publication Date: 2023-06-20
- Inventor: Shu-Shen Yeh , Chin-Hua Wang , Chia-Kuei Hsu , Po-Yao Lin , Shin-Puu Jeng
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Slater Matsil, LLP
- Main IPC: H01L23/367
- IPC: H01L23/367 ; H01L25/065 ; H01L23/00 ; H01L23/31 ; H01L23/498 ; H01L21/48 ; H01L21/56 ; H01L25/00

Abstract:
Semiconductor devices and methods of manufacture which utilize lids in order to constrain thermal expansion during annealing are presented. In some embodiments lids are placed and attached on encapsulant and, in some embodiments, over first semiconductor dies. As such, when heat is applied, and the encapsulant attempts to expand, the lid will work to constrain the expansion, reducing the amount of stress that would otherwise accumulate within the encapsulant.
Public/Granted literature
- US20220246490A1 Semiconductor Device and Method of Manufacture Public/Granted day:2022-08-04
Information query
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